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For a metal thin film with a large resistance, R□ even increases slightly with decreasing T as a consequence of the electron localization [29].
The decrease of the period time upon addition of Cu2+-ions may be explained in terms of the virtual increase of the anodic current at low potentials as a consequence of the electron consuming nature of this process.
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As a consequence of the additional electrons in NO in the NO/WO3 001) system, the bond length d N-O of NO molecule slightly increases to 1.181 Å, compared to that (1.170 Å) of a free NO molecule; see Table 1.
As a consequence of the non-equilibrium electron kinetics, electron particle and energy fluxes become of considerable importance for establishment of the plasma properties.
We note that, as a consequence of the presence of excess electrons in the polar NO molecule, the bond length d N-O of NO molecule increases to 1.212 and 1.203 Å for NO/Cu-WO3 001 NO/Cu-WO3 0013(001), respectively.
Such a strong reactivity is most likely due to the formation of dangling bonds and defects as a consequence of the hydrogen depletion caused by the electron bombardment.
As a consequence of the degradation reaction, carbon dioxide, protons and electrons were produced [5, 11].
And for both types of steel we observe a clearly increased electron emission as a consequence of the grinding process.
As a consequence of the change of the neutral gas to metal ratio the estimated effective electron temperature, Te, changes from ~ 2 eV as estimated from Ar I emission to ~ 0.3 0.6 eV as indicated by W I emission.
The observed decrease of the OSEE intensity as a consequence of the biofilm covering the SiO2/Si substrate is attributed to the attenuation of the UV-induced electron emission from the SiO2/Si substrate.
As a consequence of the latter effects, there is a degradation in the efficiency of the charge generation process and an incomplete conversion of photons to signal electrons occurs.
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