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Vertically aligned SiNW arrays were prepared by metal-assisted chemical etching [24, 25].
Transparent TiO2 NT arrays were prepared via an electrochemical anodization process [27].
TiO2 nanorod arrays were prepared on FTO glass initially based on conventional solvent-based method [20].
Carbon nanotube arrays were prepared by chemical vapor deposition (CVD) of hydrocarbon gas on various substrates.
Various bamboo-shaped nanotube arrays were prepared by using AC anodization with different current functions.
CuNi/C nanosheet arrays were prepared by pyrolyzing Ni-based metal organic framework and successive Cu electrodeposition.
First, crystalline Si nanowire arrays were prepared by wet chemical etching of Si substrates in a modified Piret's method [21].
The ZnO nanorod arrays were prepared on a silicon wafer (4 × 5 cm2) through a multi-step hydrothermal process [6].
High-quality ZnO nanorod arrays were prepared on the SnO2 buffered FTO glass by a two-step hydrothermal method.
The TNT arrays were prepared by anodizing Ti films on fluorine-doped tin oxide (FTO -coated glass substrates.
For experimental purposes, both types of TiO2 arrays were prepared with nanotube lengths of 1.0, 1.5, and 2.0 μm.
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