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Here, the motivation of employing heterogeneous nanostructure arrays is first summarized.
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For ZnO nanowire growth, a layer of dense zinc microplatelet arrays was first obtained on copper foil by an electroplating method.
In detail, well-aligned NiCoHC nanowire arrays are first prepared directly on carbon fibre paper in virtue of the bimetallic character and availability of the various Ni- and Co-based nanostructures32.
In a two-step procedure, air-annealed TNT arrays are first cathodically protonated and then partially reoxidized by Pd II) ions from a PdCl2 solution while providing a scaffold for the metallic Pd deposit.
Briefly, ZnO nanorod arrays were first fabricated on ITO/glass (10 Ω/□) using the hydrothermal method [26 29].
Gold source/drain and gate electrode arrays are first patterned by conventional photolithography and lift-off processes.
For the formation of SiGe/Si MQW nanodot arrays, PS nanosphere arrays were first resized and then used as an etching mask, as shown in Figure 1(b).
On the other hand, needle-like ZnO NW arrays were first fabricated with the CVD process followed by chemical etching of the NW arrays.
The ordered tin disulfide (SnS2) nanowire arrays were first fabricated by sulfurizing the Sn nanowires, which are embedded in the nanochannels of anodic aluminum oxide (AAO) template.
Tapered Si NW arrays were first synthesized by following a vapor-liquid-solid (VLS) mechanism using In catalyst and a hot-wire chemical vapor deposition [31].
In this letter, the highly ordered and vertical aligned ZnO nanorod arrays were first grown on p-GaN substrates via a facile hydrothermal process assisted by the inverted self-assembled monolayer (SAM) template.
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