The phrase "arrays depending on" is correct and usable in written English.
It can be used when discussing data structures or programming concepts where the arrangement of arrays is influenced by certain conditions or variables.
Example: "The algorithm processes multiple arrays depending on the input parameters provided by the user."
Alternatives: "arrays based on" or "arrays influenced by".
However, the focus of this study is to maximize the absorption or short circuit current density in NW arrays depending on the parameters NW diameter, morphology, length, and pitch.
Low-coverage WGS with ~4X coverage currently costs between 1 and 6 fold more per sample than fixed content genotyping arrays, depending on coverage.
As seen in Figures 1 and 2, two methods are employed to achieve microtube arrays, depending on etchant speed and uniformity: timed etching (process #1) and anchored membranes (process #2), for slow and fast etches, respectively.
In contrast, less than 40% of less common variants (0.01 < minor allele frequency < 0.05) are covered by low density arrays in all ancestries and 50 80% in high density arrays, depending on ancestry.
The percentage of variants with MAF between 0.01 and 0.05 and an imputation r ≥ 0.8 is substantially lower than for MAF greater than 0.05: less than 40% for low density arrays in all ancestries and 50 80% in high density arrays, depending on ancestry.
Furthermore, such arrays depend on known sequence information for the species of interest or for closely related species in conjunction with a custom-array design.
The local flame-spread-limit distance of the unevenly-spaced droplet arrays depended on the droplet arrangement and increased from the flame-spread-limit distance of the evenly-spaced droplet arrays due to interactive effects.
However, the performance of many speech enhancement methods with microphone arrays depends on the number of microphones, and the performance may degrade when a small number of microphones are used.
Thus, an investigation of resonant-optical properties of nanostructures with AuNP arrays depend on their sizes, shape and their mutual arrangement have been performed by measuring the spectral characteristics of the angle of isotropic reflection θ ρ=0 [29].
This formation process depends on the basic deposition parameters such as argon pressure P Ar and pulse number N. As shown in [20, 25], the morphology features of porous films with Au NP arrays depend on formation conditions at both the PLD and the high-frequency sputtering methods.
