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(a) Schematic of the simulated chamber containing a 14 × 14 SiNW array of diameter 0.2 μm and height 1.0 μm, and at a distance of 0.2 μm between adjacent NWs.
The schematic sketch of the chamber containing NW array of diameter 0.2 μm and height 1 μm, with a distance of 0.2 μm between the adjacent NWs, is shown in Figure 4a.
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Afterward, a silver (Ag) mesh with ordered pores was obtained by depositing Ag onto the Si substrate with arrays of diameter-reduced PS spheres [21].
The pore size of aluminum oxide is controllable and uniformly distributed; the depth of dots depends on the voltage applied; thus, it can serve as a convenient mold to fabricate tantalum into a nanodot array of specific diameter and depth.
The pore size of the aluminum oxide is controllable and uniformly distributed, whereas the depth of the dots depends on the voltage applied; thus, this can serve as a convenient mold for fabricating tantalum into a nanodot array of specific diameter and depth.
The second configuration utilizes an array of micro-diameter holes located on the face of the step, allowing for air injection in the streamwise direction.
Square arrays of Si NPs (diameter 250 nm, height 150 nm, period 1 μm, and area 1 × 1 mm2) were fabricated by electron beam lithography (EBL) and dry etching, as shown in Fig. 1a, b.
As a fabrication method with so many steps, especially with the RIE step which fluctuates a lot, it is hard to obtain nanowire arrays of equal diameter for dry oxidation from every sample.
An acrylic master mold having 4×6 arrays of pillars (diameter: 7 mm, height: 4 mm) was fabricated with a rapid prototyping machine (MDX-40, Roland Inc., Los Angeles, CA).
An array of Si nanowires (diameter = 189 ± 30 nm, length ~16 μm) was fabricated with CVD.
A staggered tube array of 1.5 mm diameter tubes was tested over a wide range of flow velocities.
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