Sentence examples for approach using high from inspiring English sources
For each vaccine strain one TaqMan-qPCR assay and one alternative approach using High Resolution Melting (HRM) analysis was designed.
Our approach, using high temporal and spatial resolution measurements of TEC, will contribute to the monitoring of ionospheric TEC at mid-latitudes and the study of geomagnetic storms.
An effective approach using high intensity ultrasonic vibration to optimize the microstructure of in situ particulate reinforced metal matrix composites was given firstly, and the mechanism of ultrasonic vibration was also discussed.
A different approach using high dielectric materials such as silicon combined with nanoscale structures that also results in a high field enhancement was also reported.
Through this study, we will develop an original approach using high technology tools associated to data processing techniques to evaluate 'automatically' the behavioural dynamics of the OR staff and their impact on the SSI risk.
Through the present study, we will develop an original approach using high technology tools (motion tracking and inertial sensors) to evaluate the behavioural dynamics of healthcare workers in the OR and their impact on the SSI risk.
Our approach using high-density tiling microarrays also provided us with a "macroscopic" perspective of the epigenetic and transcriptional responses to maternal care.
We propose to apply PSI approach using high-resolution TSX imagery to extract the regional scale subsidence related to the road network.
We evaluated their approach using high-density oligonucleotide microarrays and Latin-square designed experiments consisting of 6 and 8 rRNA targets in 16 different artificial mixtures.
In the paper the recent advantages in the development of adaptive output control approach using high-gain principle named by the authors as "consecutive compensator" is applied for SISO channels.
Strain engineering based on either a global approach using high-mobility substrates or the implementation of so-called processing-induced stressors has become common practice for 90 nm and below CMOS technologies.
