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Fig. 1 Schematic diagram of a (Ti, Al)N/MoN multilayered films deposited on Si substrate and b the relation between incident angle and tilt angle of thin film.
DSR test results revealed that the complex modulus and phase angle of thin film oven (TFO -aged OBA boTFO -agedsed with the elevated aging level, indicating an increase in viscOBAty during aging process.
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In contrary to the damage found in the flat regions, the edges of FLG are found to be much rougher; with four distinct features as shown in Figure 9, (1) the upper edge regions are not smooth and show irradiation energy dependent wiggles, and (2) the shadowing effects similar to those found in oblique angle growth of thin films are observed [32].
The sessile drop method was adapted for measuring contact angle of a thin film of NPs.
The grain size of a MAPbI3 perovskite film increases with the oblique sputtering angle of ITO thin films from 0° to 80°, indicating that the surface properties of the ITO affect the wettability of the PEDOT PSS thin film and thereby dominates the number of perovskite nucleation sites.
In addition, shadowing effects similar to those found in oblique-angle growth of thin films were seen.
In recent years, oblique angle deposition (OAD) of thin films as a physical vapor deposition method has provided facilities for the production of variety of nanostructures with structural anisotropy which can be controlled by pre-design of the structure [41, 42].
In a microchannel heat exchanger we modified the surface wettability from a contact angle of 20° 120° using thin film coating technology.
In contrast, connections with long gage distance g t ' of thin angles deflect a lot at the ultimate load and the proposed prediction model using the assumption of small deformation leads to very conservative estimation of connection element forces.
The residuals are converted to VTEC (we call them VTEC anomalies) by multiplying with the cosine of the incident angle of LOS with a thin layer at the ionospheric E-region altitude (100 km).
To enhance the signal-to-noise ratio of electrochemical in situ IRRAS techniques, experimental conditions such as the angle of incidence and the thin cavity thickness should be optimized.
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