The one-to-one mapping is often used for pairwise network alignment to find the precise matching, while many-to-many mapping is more used in multiple network alignment for studying the evolutional events.
Although 15 centromeres show nearly precise alignment to the functional centromere, with ∼10-bp/33-bp/10-bp spacings between peak maxima, Cen4 is an exception in showing ∼10-bp/25-bp/10-bp spacings.
The restoration is unlikely to solve the riddles of Stonehenge's original purpose or the precise reasons behind its alignment to the rising of the sun at the summer solstice.
By using ultraviolet photoelectron spectroscopy it was found that dependent on the deposition conditions these gap states and work function of the metal oxides may be tailored to contribute to the precise alignment of the HOMO of the organic semiconductor (OSC) with the Fermi level of the anode electrode resulting in further enhancement of the device performance.
In this study, we showed the importance of using recombination-free alignments to estimate precise τ and θ.
Even though the controlled assembly of single SWNT bundles has been studied by using various voltage magnitudes and types [28], a thorough investigation into electrode geometry and solution concentration is still necessary to achieve the precise alignment of individual SWNTs and small nanotube bundles.
Now, the commission said, individual New Jersey municipalities are protesting, either before the commission or in appeals to courts, against the precise alignments through their localities.
The ability of collagen to provide a strong network and to fully mineralise depends on the precise alignment of the type I collagen molecules in the collagen fibre.
"Your electric toothbrush requires precise alignment to charge," he said.
Faulting of intact rock samples in uniaxial condition occurs only when the specimen is subject to a high stress as a result of the precise alignment of apparatus and specimen, and large piezoelectricy is expected in such a condition.
Several studies have been performed for the precise alignment of mask patterns with respect to crystallographic directions on {110} and {100} silicon wafers [155-160].
