The phrase "alignment of projection" is correct and usable in written English.
It can be used in contexts related to planning, design, or analysis where the focus is on ensuring that projections or forecasts are aligned with certain criteria or objectives.
Example: "The alignment of projection is crucial for ensuring that our financial forecasts match our strategic goals."
Alternatives: "synchronization of projection" or "congruence of projection".
As Fig. 1 shows, even a perfect set of initial conditions (no noise, no missing wedge, perfect alignment of the projections) introduces ambiguity into the reconstruction.
Manual and computational alignment of the projections from these classes suggested intimate associations and the potential to form a neural circuit.
A non-rotating marker was added in the image field, allowing to check and refine the horizontal alignment of all the projections.
A non rotating marker was added in the image field to allow for checking and refining the horizontal alignment of all the projections.
Alignment of these particles by projection matching showed that the 'arm' density was a significant feature of these particles and did not disappear during filtering.
For alignment of the tilt-series projections, small spherical cellular features or ice contaminants were employed as tracking markers, or patch tracking following the routine in the Etomo GUI of IMOD was applied.
67 tilt-pairs were subjected to the fast-freehand test as implemented by John Rubinstein (Hospital for Sick Children, Toronto, Canada) and adapted by Michael Cianfrocco (University of California Berkeley, Berkeley) to use the EMAN2 and SPARX libraries for alignment of particles to model projections (Hohn et al., 2007; Tang et al., 2007).
One problem with this procedure is that the correct directions were all clearly specified by the 2D alignment of texture elements within the optical projection of each surface, so that successful performance did not necessarily require a perceptual analysis of 3D shape.
The orientation stage requirements are distinct from those used in photolithography since the depth of focus of projection optics allows for larger errors in the orientation alignment.
But in most cases, the overlapped structures in 2D projections interfere correct alignment of the common portion of the molecule.
