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Discover LudwigThe phrase "ald compared to" is not correct in English.
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The original response, however, can be fully recovered by etching out the alumina; (a) shows four plots: the original reflectivity spectrum, the spectrum after 20 cycles of alumina ALD compared to 50 cycles, and a plot of the recovered original response after HF cleaning.
It clearly demonstrates the significant improvement of wettability when the water contact angle reduces to 65.76° with the deposition of Al2O3 film on PET by ALD, compared to the contact angle of the uncoated substrate (88.26°).
Both drain current and mobility were enhanced in graphene FETs with 9-nm-thick Al2O3 by plasma-assisted ALD, compared to those obtained with a 9-nm-thick, e-beam-evaporated SiO2 interfacial layer plus a 15-nm-thick Al2O3 layer by thermal ALD (Figure 6d).
As a result of the lower antibody rate in their healthy control group, however, a significantly higher ASCA prevalence was found in the ALD compared to healthy controls.
Provided that the history of the dogs in the study sample matches the clinical diagnosis of CAD, one could speculate whether pugs and Jack Russell terriers are overrepresented with ALD compared to other breeds.
Similar(55)
In conclusion, although silicon alkoxide as oxygen source can limit effectively the formation of SiO2-rich interfacial layer, it has substantially slow kinetics for HfSixOy ALD as compared to H2O for HfO2 ALD.
Single aluminium oxide films by plasma-enhanced ALD were compared to thermally grown layers and showed a significantly better barrier performance.
In this study, ALD was compared to PVD as a step coverage problem by filling 500-nm-thick nanoporous AAO thin films with 67-nm-diameter pores as templates for the TiO2 nanowires.
Our data indicate differences in biomarker performance in NAFLD and ALD patients compared to performances reported in viral hepatitis.
After four ALD cycles at 473 K, nominal carbon coverage was about 10 times higher than for the O2 half-cycle at 623 K. Alumina growth observed for the O2 half-cycles at 473 K was much slower at these conditions, with a measured nominal thickness of ca. 5 Å after 4 ALD cycles, compared to ca. 15 Å after 4 cycles with O2 dosing at 623 K.
However, a much higher number of ALD cycles (1200 compared to 100 for Si) are necessary to obtain Ni nanoparticles of similar size and the number density of particles is lower than observed for Si substrates.
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