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The polymer islands were acted as masks.
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Thus, additional atherosclerosis risk factors such as smoking or obesity, which are frequently associated with statin intake, could act as masking confounders.
After the wet-etching process, the remaining photoresists that acted as etching masks were removed using acetone.
The melted layer acted as a mask against irradiation.
In the process, ND particles acted as etching mask for fabricating vertically aligned N2-UNCD nanorods.
The Ag nanoparticles acted as a mask for nanostructure formation during dry anisotropic etching by inductively coupled plasma (ICP).
In the previous studies [12 15], some researchers suggested that the superficial oxygen-rich layer acted as a mask during KOH etching.
This process used nanosphere lithography (NSL) encompassing the deposition of monolayered Polystyrene (PS) followed by a convective self-assembly drop coating protocol onto the ITO substrate that further acted as the mask after the AuNP assembly.
The NAAMs acted as a transfer mask in the resulting structure.
In other words, the Au nanodots also acted as a protective mask to prevent the dissolution of the GaAs substrate.
The formation of the protrusive nanostructures (hillocks) was ascribed to the difference in etching rate of the scratched area and original silicon surface, where the scratched area acted as a resist mask against etching [11, 12].
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