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The influence of doping on the electrical properties of graphene was assessed by Kelvin Probe Microscopy (KPM) and standard Hall Effect measurements, proving the ability of the method to effectively tune the carrier concentration, achieving sheet resistances as low as 79 Ω/sq.
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Summarily, it is necessary to wash AgNWs for four cycles using ethanol to reduce the PVP layer thickness to about 2.5 nm and achieve sheet resistance below 10 and 100 Ω sq−1 for transmittance below 82 and 95%%, respectively.
As a proof-of-concept, we achieve sheet-like SiOx nanocomposites via in-situ transformation of delaminated siloxene.
These works can be extended to achieve light sheet type illumination as well.
To achieve low sheet resistance at low temperatures, the authors have attempted to incorporate other conductive materials into AgNWs to create conductive bridges between them.
In the present work, a thin PVP nanolayer made it possible to reduce percolation threshold and achieve low sheet resistance with a limited number of conductive paths.
Several proton implants were performed in order to find the threshold dose (minimum dose to achieve maximum sheet resistivity) for the electrical isolation of n-type GaNxAs1−x layers.
As a result of this work, we have successfully achieved low sheet resistance (7.0 Ω/□) and high transmittance (~90%) for 300 nm thick films.
The backside (not polished side) was doped additionally with boron by ion implantation to achieve low sheet resistance about 24 Ω/□ in order to provide good electrical contact of the wafer's backside to the electrolyte during the anodization process.
To achieve graphene sheets, exfoliation of their stacked form (e.g., by highly oxidants) is needed [17].
Different post-treatments were evaluated (phosphate ions, ethanol, steam sterilization and water vapor) to increase the content of β-sheets thereby achieving water insolubility of the films.
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