The phrase "a solution consisting of" is correct and usable in written English.
You can use it when describing the components or elements that make up a particular solution in a technical or scientific context.
Example: "The experiment yielded a solution consisting of water, salt, and sugar, which was then analyzed for its properties."
Alternatives: "a solution made up of" or "a solution composed of".
Or Section 2(b), which calls for cleaning surfaces in reach of the suspect with a "solution consisting of a 10-to-1 ratio of water to bleach" and then drying those surfaces.
The regeneration of the SMZ was also evaluated using a solution consisting of 30 g L−1 NaCl and 1.5 g L−1 NaOH at pH 12 and temperature 30 °C.
The electrochemical polymerization of aniline in a solution consisting of 0.2 M aniline, 2 M H2SO4 and 30% ionic liquid (v/v), 1-ethyl-3-methylimidazolium ethyl sulfate (EMIES), was performed at a constant potential of 0.70 V versus SCE.
As electrolyte, a solution consisting of NiCl2, NiSO4 and H3BO3 has been employed.
There wasnt enough time to rip up the tile floor and reroute the hospital plumbing, so she devised a solution consisting of a long, brass-trimmed shower nozzle.
In summary, Cu2O thin films were deposited on Ti sheets in a solution consisting of cupric acetate and sodium acetate by electrodeposition method.
The cells were washed twice with a solution consisting of 1% Triton X-100 (pH 7.0), 50 mM sodium phosphate and 5 mM EDTA.
The cleavage and the removal of the side chain protecting groups of the peptide from the resin was performed with a solution consisting of 3600 μL trifluoroacetic acid, 200 μL deionized water and 200 μL triisopropylsilane.
The cells were harvested, and washed three times with ice-cold phosphate-buffered saline, incubated in 10% trichloroacetic acid for 1 h, and incubated with a solution consisting of 0.3 mol/L NaOH and 1% SDS for 2 h.
The synthons 11CH3I or 18FEtBr were bubbled into a solution consisting of the phenolic precursor, 4-hydroxy-N-[2- 4-sulfamoylphenyl)ethyl]benzamide (2, 0.2 mg) and Cs2CO3 (1 to 2 mg) in anhydrous dimethylformamide (DMF).
In this process, Si wafer coated with a noble metal is etched in a solution consisting of HF and an oxidant (e.g., H2O2 or AgNO3) to form the nanostructures.
