The phrase "a direct pattern of" is correct and usable in written English.
It can be used when describing a clear and straightforward arrangement or sequence of elements in various contexts, such as data analysis, design, or behavior.
Example: "The study revealed a direct pattern of consumer behavior that correlated with seasonal trends."
Alternatives: "a clear pattern of" or "an explicit pattern of".
In the end, this enables a direct patterning of the lithium anode layer.
Here, we show that low-keV-electron beams enable a direct patterning of tetrahedral amorphous carbon (ta-C) thin films by inducing a local graphitization without the need for any resist or development process step.
The method is based on a direct patterning of poly ethyleneglycol) (PEG) bio-inert layers on a conducting indium tin oxide (ITO) substrate using electron beam lithography and subsequent assembly of modified amine reactive layers onto the exposed areas.
After its formation, the PS is maintained as a zone of massive ingression that generates a more direct pattern of cell convergence, with cell trajectories perpendicular to the axis of the PS (Video 8; see Figure 1, stage 3+).
In co-culture with CAFs (but not NPFs), BPH-1 cells had a more invasive, elongated phenotype with increased motility and a more directed pattern of cell migration.
In our previous study, we proposed a lower damage direct patterning of oxide layers by mechanical processing.
We report on a new approach where the direct patterning of an intermediate mask has been performed by an upgraded Leica ZBA shaped electron beam writer at 40 kV in order to achieve ultimate high throughput combined with superior resolution.
This is due to the fast printing process with great accuracy allowing direct patterning of nanomaterials onto a substrate.
Moreover, direct patterning of the DNA films is demonstrated with a resolution down to 100 nm, enabling the realization of both surface-emitting and edge-emitting DFB lasers with a typical line width of <0.3 nm.
The system allows the direct patterning of high resolution structures (down to 40 nm).
