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Samples Cu2, Cu3, and Cu4 were electrochemically deposited in a mixture of 0.01 mol/L Cu(NO3 2 and 0.1 mol/L H3BO3 aqueous solution at a depositing potential of −8.5 V with deposition time of 1 s and interval time of 5 s.
Samples Ag3, Ag4, and Ag5 were electrochemically deposited in a mixture of 0.01 mol/L AgNO3 and 0.01 mol/L H3BO3 aqueous solutions at a depositing potential of −6.5 V with deposition time of 2 s and interval time of 5 s.
The deposition process was kept with target substrate at room temperature with a depositing rate of 0.03 nm/s.
The deposition rate of TiNx films increased from 42 to 90 µm/h at a depositing area of 10 mm by 10 mm substrate, decreasing with increasing PL and Tpre.
(a) Depositing an Al film on the SiO2/Si substrate.
However, since a depositing metal is different from a depositing semiconductor, it is still a critical challenge to controllably produce metal/semiconductor nanostructures with a designed morphology in one-step electrodeposition.
Similar(46)
Call it a deposit with no return.
Reservations and a deposit are necessary.
A pigeon can still make a deposit on a Ferrari".
You haven't made a deposit on a winter break.
He and his wife paid a deposit for a $555,000 condo.
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