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Figure 5 shows the typical field emission characteristics measured under a base vacuum of 2.4 × 10-5 Pa.
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Philips EM CM-12 was used for TEM measurements, whereas the X-ray photoelectron spectrum was recorded in VSW ESCA instrument (using Al Kα radiation with a total resolution ~0.9 eV at 2 × 10−9 torr base vacuum).
The XPS spectra were recorded using a VSW ESCA instrument with a total energy resolution ~0.9 eV fitted with an Al Kα source (soft X-ray source at 1486.6 eV) at base vacuum >10−9 Torr.
The BTO film was grown on NSTO substrates by pulsed laser deposition (PLD) using a KrF excimer laser (248 nm, 25 ns pulse duration, COMPexPro201, Coherent) at an energy of 300 mJ and frequency of 5 Hz, with the base vacuum of 2 × 10−4 Pa.
Magnetron sputtering technique was used with high base vacuum and high purity working gas (Argon 99.99%) together with a stable deposition rate during the fabrication process.
The base vacuum reached 10−4 Pa and the operating vacuum pressure was approximately 10−2 Pa.
The base vacuum of the cathode is no less than 2 × 10−4 Pa.
During the metal deposition, the base vacuum was 10-5 Pandnd the argon pressure during sputtering was 0.1 Pa.
The analysis area was 650 μm in diameter, and the base vacuum in the analytic chamber was 1 × 10−9 Torr.
The base vacuum was 6.0×10-4 Pandand the deposition pressure was 1.0 Pa with an argon (4N) flow rate of 45 sccm.
Two aromatics-rich distillates R1 and R2 with different properties from naphthenic base vacuum gas oil were used for preparing mesophase pitch through high-pressure thermal treatment.
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