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To overcome this difficulties, selected area epitaxial re-growth of doped III-N materials was developed to form source-drain contacts on otherwise low-doped III-N epitaxial substrates, yielding the needed N+/n−/N+ or N+/p−/N+ structures.
In order to overcome this difficulties caused by possible exclusion of the origin from C, Yao and Xu [14] and Cui and Liu [15] put forward the improvement strategy to impose the metric projection P C on the right side of the (1.3) and (1.4) when u = 0.
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Several differentials have been developed to overcome this difficulty.
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To overcome this difficulty, this paper proposes MBTI-EAGRP.
Many suboptimal methods were presented to overcome this difficulty.
Modified coating configurations are suggested to overcome this difficulty.
To overcome this difficulty, we employ Kelvin type transforms.
To overcome this difficulty, we chiefly follow the ideasof [5].
To overcome this difficulty, two approaches are used.
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